SPIE Advanced Lithography + Patterning 2027

Mednarodna specializirana razstava - konferenca

od 21 do 25 februarja

Manj kot 4 mesecev do odprtja razstave — pravočasno rezervirajte najboljši razstavni prostor!

Z Excenter ogled zemljevida | San Jose, Združene države

Pogosta vprašanja o razstavi

Razstava

Sejemska prireditev za strokovnjake v industriji!

Obiskovalci

Vedno ciljno občinstvo!
SPIE Advanced Lithography + Patterning 2027
SPIE Advanced Lithography + Patterning 2027

Države

Široka geografska raznolikost udeležencev!

O razstavi

The SPIE Advanced Lithography + Patterning exhibition in San Jose is a leading global forum for knowledge exchange and innovation in lithography and patterning. This annual event attracts experts from academia and industry who seek to address specific challenges in the semiconductor sector. Organized by SPIE, the international society for optics and photonics, the conference serves as a central platform for presenting and discussing the latest achievements, research results, and technological innovations. The exhibition includes a variety of conferences, courses, and a related exhibition where participants can learn about the latest product innovations, meet industry leaders, and establish valuable business contacts. The ideal combination of theoretical knowledge and practical application makes this event indispensable for professionals in the field of lithography. The event covers a wide range of topics, including lithographic equipment, nanotechnology products, materials, abrasives, chemicals, software, optical components, microtechnology, cameras, and imaging systems. It also addresses testing and measurement devices, microscopes, data processing software, processing hardware, optical coatings, thin films, detectors, sensors, as well as lasers and laser systems. This diversity of topics highlights the complexity and interdisciplinary nature of modern lithography technologies and their applications. A distinctive feature of the SPIE Advanced Lithography + Patterning exhibition is its location in San Jose, in the heart of Silicon Valley. This geographical position provides additional advantages, allowing participants to be in one of the world's leading technology hubs, where innovation and progress are part of everyday life. Proximity to numerous high-tech companies and research institutions fosters exchange and offers unique networking opportunities. The exhibition is also seen as an incubator for future technological developments and a central point for shaping the future of the semiconductor industry. The combination of high-quality lectures, interactive courses, and an extensive exhibition provides participants with the opportunity to stay updated on the latest technical advancements and actively engage in the direction of the industry. We invite you to participate in the SPIE Advanced Lithography + Patterning exhibition and become part of this significant event!

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Moje potovanje na razstavo

SPIE Advanced Lithography + Patterning 2027

Prostor razstave

Kako priti do sejemskega prostora?

V gostiteljsko mesto

San Jose
Potniki Odrasli 1 Otroci 0 Dojenčki 0
Razred kabine
Preference letenja
Postanki
Čas odhoda 00:00 24:00
Čas prihoda 00:00 24:00

V prostor razstave

Z Excenter 1 Ul. 1, San Jose, Združene države

Udeleženci

Vodila industrijska podjetja!

Zahteva za sodelovanje na sejemski prireditvi

SPIE Advanced Lithography + Patterning 2027

Ocenjena površina
območje




Manj kot 4 mesecev do odprtja

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